Research

Pertinent scientific papers (of Bologna's group)

  • Biscarini, F., et al. 1997. Roughness increase and dimensional transitions during the growth of GaBa2Cu3O6+y films on NdGaO3. Nuovo Cimento Della Societa Italiana Di Fisica D-Condensed Matter Atomic Molecular and Chemical Physics Fluids Plasmas Biophysics 19, no. 8-9:1003-1008.

  • Dediu V., et al. 1997. Oxygen diffusion in GdBa2 CU3 O(6+y) thin films. Nuovo Cimento Della Societa Italiana Di Fisica D-Condensed Matter Atomic Molecular And Chemical Physics Fluids Plasmas Biophysics 19, no. 8-9:1047-1052.

  • Dediu V., et al. 1996. Observation of the Stranski-Krastanov growth transition in GdBa2Cu3O7--d films. Phys. Rev. B 54, 1564-1567.

  • Dediu V., and Matacotta F.C. 1996. Oxygen diffusion in epitaxial GdBa2Cu3O7-d thin films. Phys. Rev. B 54, 16259-16263.

  • Dediu V., et al. 1997. Roughness increase and dimensional transitions during the growth of GaBa2Cu3O6+y films on NdGaO3. Nuovo Cimento Della Societa Italiana Di Fisica D-Condensed Matter Atomic Molecular And Chemical Physics Fluids Plasmas Biophysics 19, no. 8-9:1003-1008.

  • Dediu V.I., et al. 1995. Deposition of MBa2Cu3O7-x thin films by channel-spark method. Supercond. Sci.Technol. 8, 160-164.

  • Scardi P., Matacotta F.C., Dediu V., and Correra L. 1997. X-Ray Diffraction line broadening effects in Mba2Cu3O7-d (M=Y, Gd) thin films. Journal of Material Research 12, 28-37.

  • Scardi P., et al. 1997. XRD Line Profile Analysis of HTc superconducting thin films. Advances in X-Ray Analysis 40.

  • M. P. de Jong, I. Bergenti, W. Osikowicz, R. Friedlein,V. A. Dediu, C. Taliani, and W. R. Salaneck
    Valence electronic states related to Mn 2+ at La0.7 Sr0.3 MnO3 surfaces characterized by resonant photoemission
    Phys. Rev B 73, 052403 (2006)

  • MP. de Jong, I. Bergenti, V.A. Dediu, M. Fahlman, M. Marsi and C. Taliani,
    Evidence for Mn2+  ions at surface of La0.7Sr0.3MnO3 thin films
    Phys. Rev. B, 71, 014434, (2005)

  • Hayer A, Kohler A, Arisi E, Bergenti I, Dediu A, Taliani C, Al-Suti M, Khan MS
    Polymer light-emitting diodes with spin-polarised charge injection
    Synth. Met., 147 (1-3): 155-158 Sp. Iss. SI (2004)

  • Bergenti I, Dediu V, Murgia M, Riminucci A, Ruani G, Taliani C,
    Transparent manganite films as hole injectors for organic light emitting diodes”
    J. of Luminesc, 110 (4): 384-388 (2004)

  • M. P. de Jong V. A. Dediu and C. Taliani, W. R. Salaneck Electronic structure of La0.7 Sr0.3 MnO3 thin films for hybrid organic/inorganic spintronics applications
    J. Appl. Phys. 94, 11 (2003)

  • Bergenti I, Dediu V, Arisi E, Mertelj T, Murgia M, Riminucci A, Ruani G, Solzi M, Taliani C., Spin polarised electrodes for organic light emitting diodes” Organic Electronics, 5 (6): 309-314 (2004)

  • De Jong MP, Dediu VA, Taliani C, Salaneck WR,
    Electronic structure of La0.7Sr0.3MnO3 thin films for hybrid organic/inorganic spintronics applications J. Appl. Phys., 94 (11): 7292-7296 (2003).

  • E. Arisi, I Bergenti, V. Dediu, M. A. Loi, M. Muccini, M. Murgia, G. Ruani, C. Taliani and R. Zamboni,
    Organic light emitting diodes with spin polarized electrodes.
    J. Appl. Phys., 93, 7682, (2003)

  • V. Dediu, M.Murgia, F.C. Matacotta, C. Taliani, and S. Barbanera, "
    Room temperature spin polarized injection in organic semiconductor".
    Solid State Commun., 122, 181, (2002)

  • C. Taliani, V. Dediu, F. Biscarini, M. Cavallini. M. Murgia, G. Ruani and P. Nozar, “Organic/Inorganic Hybrid Spin Valve:a Novel Approach to Spintronics”.
    Phase Transition, 75 n. 7-8, 1049 - 1058, (2002)
    V. Dediu, M. Murgia, S. Barbanera*, C. Taliani Spin valve effect in hybrid organic-inorganic device AIP Conference Proceedings -- November 7, 2001 -- Volume 591, Issue 1, pp. 548-552

  • Ya. E. Krazik et. al. Characterization of the channel spark discharge and the generated electron beam, J. Appl. Phys. 99, 063303 (2006)

Other papers on PPD fabrication

  • Chen, L. M., et al. 2005. Ordered nanostructures on La-Sr-Cu-O thin films deposited by pulsed electron beam technique. Acta Physica Sinica 54, no. 6:2843-2846.

  • Jiang Q.D., et al. 1993. Characterization and insitu fluorescence diagnostic of the deposition of YBa2Cu3O7-x thin films by pseudo-spark electron beam ablation. Supercond. Sci. Technol. 6, 567-572.

  • Jiang, Q. D., et al. 1994. Deposition of Yba2cu3o7-X Thin-Films by Channel-Spark Pulsed Electron-Beam Ablation. Thin Solid Films 241, no. 1-2:100-102.

  • Ko, K. P., et al. 2005. High quality SmBa2Cu3O7-delta thin films on SrTiO3 (100) substrates deposited by pulsed electron beam deposition. IEEE Transactions on Applied Superconductivity 15, no. 2:3054-3057.

  • Miao, H., et al. 2004. Ti(C,N) hard coatings prepared by pulsed high energy density plasma. Euro Ceramics Viii, Pts 1-3 264-268, 605-608.

  • Miao, H. Z., et al. 2004. Nanometer grain titanium carbonitride coatings with continuously graded interface onto silicon nitride cutting tools by pulsed high energy density plasma. Materials Science and Engineering A-Structural Materials Properties Microstructure and Processing 384, no. 1-2:202-208.

  • Miao, H. Z., et al. 2005. Structure of the coatings onto ceramic cutting tools deposited by pulsed high energy density plasma. High-Performance Ceramics Iii, Pts 1 and 2 280-283, 1207-1210.

  • Miao, H. Z., et al. 2003. Study of hard and wear-resistant films onto silicon nitride ceramic cutting tools by pulsed high energy density plasma. Rare Metal Materials and Engineering 32, 248-251.

  • Peng, Z. J., et al. 2003. Microstructure and mechanical properties of titanium nitride coatings for cemented carbide cutting tools by pulsed high energy density plasma. Chinese Science Bulletin 48, no. 13:1316-1320.

  • Peng, Z. J., et al. 2003. Hard and wear-resistant titanium nitride coatings deposited by pulsed high energy density plasma for cutting tools. Acta Metallurgica Sinica 39, no. 6:561-564.

  • Peng, Z. J., et al. 2005. Wear-resistant titanium carbonitride coatings onto WC-Co cutting tools by pulsed high-energy density plasma. Journal of the American Ceramic Society 88, no. 7:1786-1791.

  • Peng, Z. J., et al. 2003. Hard and wear-resistant titanium nitride films for ceramic cutting tools by pulsed high energy density plasma. Surface & Coatings Technology 166, no. 2-3:183-188.

  • Peng, Z. J., et al. 2003. Study on the residual stresses of Ti(C,N)-coated WC cutting tools by pulsed high energy density plasma gun. Rare Metal Materials and Engineering 32, 260-263.
    Sokolowska, A., A. Olszyna, A. Michalski, and K. Zdunek. 1991. Diamond Layers Deposited from Impulse Plasma. Surface & Coatings Technology 47, no. 1-3:144-155.

  • Struts, V. K., et al. 2002. Formation of protective coatings on metals by intense pulsed ion beam. Surface & Coatings Technology 158, 494-497.

  • Yan, P. X., S. Z. Yang, B. Li, and X. S. Chen. 1996. High power density pulsed plasma deposition of titanium carbonitride. Journal Of Vacuum Science & Technology A-Vacuum Surfaces And Films 14, no. 1:115-117.

  • Yan, P. X., S. Z. Yang, B. Li, and X. S. Chen. 1995. A New Technique for Deposition of Titanium Carbonitride Films at Room-Temperature by High-Energy Density Pulse Plasma. Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atoms 95, no. 1:55-58.

  • Yan, P. X., et al. 1996. Deposition of diamond-like carbon films on an iron substrate by a pulsed high-density plasma beam at room temperature. Materials Chemistry and Physics 45, no. 2:167-170.

  • Yang, W. B., et al. 2003. Investigation of diamond-like-carbon films deposited on glass substrate by using a pulsed high energy density plasma gun. Acta Physica Sinica 52, no. 1:140-144.

  • Strikovski, M., and K. S. Harshavardhan. 2003. Parameters that control pulsed electron beam ablation of materials and film deposition processes. Applied Physics Letters 82, no. 6:853-855.

  • Witke, T., A. Lenk, and B. Schultrich. 1996. Investigation of plasma produced by electron pulse ablation. IEEE Transactions on Plasma Science 24, no. 1:61-62.

  • Witke, T., A. Lenk, and P. Siemroth. 1997. Channel spark discharges for thin film technology. IEEE Transactions on Plasma Science 25, no. 4:758-762.

  • Hubicka, Z., et al. 2005. Investigation of the RF pulse modulated plasma jet system during the deposition of Pb(ZrxTi1-x)O-3 thin films on polymer substrates. Surface & Coatings Technology 200, no. 1-4:940-946.

  • Ko, K. P., et al. 2005. High quality SmBa2Cu3O7-delta thin films on SrTiO3 (100) substrates deposited by pulsed electron beam deposition. IEEE Transactions on Applied Superconductivity 15, no. 2:3054-3057.

  • Nistor, M., et al. 2005. (Zr, Sn)TiO4 thin films for application in electronics. Applied Surface Science 247, no. 1-4:169-174.
    Sonegawa, T., K. Ohtomo, W. H. Jiang, and K. Yatsui. 2000. Thin-film deposition of (BaxSr1-x)TiO3 by pulsed ion beam evaporation. IEEE Transactions on Plasma Science 28, no. 5:1545-1548.

  • Sonegawa, T., K. Ohtomo, W. H. Jiang, and K. Yatsui. 2000. Thin-film deposition of (BaxSr1-x)TiO3 by pulsed ion beam evaporation. IEEE Transactions on Plasma Science 28, no. 5:1545-1548.

  • Choudhary, R. J., et al. 2004. Pulsed-electron-beam deposition of transparent conducting SnO2 films and study of their properties. Applied Physics Letters 84, no. 9:1483-1485.

  • Huang, L., et al. 2005. Properties of transparent conductive In2O3 : Mo thin films deposited by Channel Spark Ablation. Journal of Vacuum Science & Technology a 23, no. 5:1350-1353.

  • Porter, H. L., et al. 2005. Growth of ZnO films on C-plane (0001) sapphire by pulsed electron deposition (PED). Materials Science And EngineeringB-SolidState Materials For Advanced Technology 119, no. 2:210-212.

  • Sokolowski, M. 1979. Deposition of Wurtzite Type Boron-Nitride Layers by Reactive Pulse Plasma Crystallization. Journal of Crystal Growth 46, no. 1:136-138.

  • Yan, P. X., and S. Z. Yang. 1994. Pulse Plasma Deposition of Cubic Boron-Nitride Thin-Films on Silicon Substrate. Physica Status Solidi A-Applied Research 145, no. 1:K29-K32.

  • Frolov, G. I., V. S. Zhigalov, and O. A. Bayukov. 1999. Phase composition of nanocrystalline iron films deposited in a nitrogen atmosphere. Physics of the SolidState 41, no. 10:1669-1671.

  • Frolov, G. I., et al. 2003. Microstructure and properties of Co-Sm-O nanogranular films. Physics of the SolidState 45, no. 12:2303-2308.

  • Kellerman, P. L., M. P. Bradley, and S. Qin. 2002. Active charge control in PIII - enlarging the process space. Surface & Coatings Technology 156, no. 1-3:77-82.

  • Liu, B., et al. 1999. Investigation of titanium coating on Si3N4 by using a pulsed high energy density plasma (PHEDP) gun. Materials Chemistry and Physics 57, no. 3:219-223.

  • Michalski, A., and A. Sokolowska. 1995. Photovoltaic Cell with an A-Cbn Layer. Thin Solid Films 266, no. 2:110-112.

  • Yu, W. P., et al. 2000. Oxidation resistant coatings of ZrO2 and ZrO2-Y2O3 applied by high energy pulse plasma deposition. High Temperature Materials and Processes 19, no. 6:435-442.

Presentations

  • Organic Spintronics s.r.l. A spin-off company of the Italian National ResearchCouncil, (CNR)
     
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