GEN V

 

PPD Gun Series

The OS PPD GEN V SERIES Electron/Plasma Source is the fifth generation of sources designed by OS with improved performances in terms of repetition rate, efficiency, roughness. 

Download the PPD video (WMV 4.6 MB)

Characteristics

Rugged construction

stainless steel (SS304) and glass

Small geometrical form factor

63mm diameter, suitable for parallel close packing PPD sources

Adjustable cathode gas inlet flow

permits variable operating pressures (see below)

Replaceable capillary for extended lifetime

PPD-CT series (available from stock)

z-adjustable position in the deposition chamber

250mm

Compact electronic design

 

Indipendent triggering system

 

Bakeable

up to 200°C

Low electromagnetic noise

 

Two or more PPD Guns can be syncronized

 

No moving parts

 

 

Specifications

Max. rep. rate

200 Hz

 

Beam cross section

3÷50 mm2

according to electrod dimension

Mean electron energy

2KeV

 

Max. electron energy

20 KeV

 

Pulse power density

4÷600 MW/cm2

 

Max. pulse energy

> 4 J

 

Min. Pulse energy

< 0.1 J

 

Cathode lifetime

5x109 shots

 

Operating voltage

8÷25 KV

 

HV power supply

0÷25 KV, 50mA

 

Ablation depth

0.5÷2 µm

depending on the material

Deposition rate

100÷6000 angstrom/minute

depending on the material

Efficiency

> 60%

input power (capacitors) vs output power (beam)

Input voltage

115÷230 VAC, 50/60 Hz

single phase

Deposition operating pressure

2X10-2 ÷ 5x10-5mbar

 

Mounting

UHV DN63CF flange

 

z alignement range

250 mm

optional

Data logger

Y

(voltage, pressure)

in-situ Deposition rate

Y

LTM-XXX (optional)

in-situ Spectrum analyzer

Y

PLSP (optional)