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The OS PPD Gen III standard Gun (PPD-III) is a rugged pulsed electron/plasma source in operation since 2007. It is mounted on a variety of systems with one and more sources. It allows simple operation and requires low maintenance costs. Max rep. rate 15Hz.

Characteristics

Rugged construction	stainless steel (SS304) and glass
Small geometrical form factor	63mm diameter, (DN63CF) suitable for parallel close packing of PPD sources
Adjustable cathode gas inlet flow	permits variable operating pressures (see below)
Replaceable capillary for extended lifetime	PPD-CT series (available from stock)
z-adjustable position in the deposition chamber	50mm
Compact electronic design
Indipendent triggering system
Bakeable	up to 150°C in the deposition chamber
Low electromagnetic noise
Two or more PPD Guns can be syncronized

Specifications

Max. rep. rate	15 Hz
Beam cross section	3÷12 mm2	according to capillary dimension
Mean electron energy	2KeV
Max. electron energy	20 KeV
Pulse power density	4÷300 MW/cm2
Max. pulse energy	> 2 J
Min. Pulse energy	< 0.1 J
Cathode lifetime	5x109 shots
Operating voltage	8÷25 KV
HV power supply	0÷25 KV, 10mA
Ablation depth	0.5÷2 µm	depending on the material
Deposition rate	100÷1000 angstrom/minute	depending on the material
Efficiency	> 30%	input power (capacitors) vs output power (beam)
Input voltage	115÷230 VAC, 50/60 Hz	single phase
Deposition operating pressure	5X10-3 ÷ 2x10-5 mbar
Mounting	UHV DN63CF flange
z alignement range	50 mm	optional
Data logger	Y	(voltage, pressure)
in-situ Deposition rate	Y	LTM-XXX (optional)
in-situ Spectrum analyzer	Y	PLSP (optional)